Ion pumps create high vacuum and ultra-high vacuum (UHV) environments in a variety of applications, ranging from portable mass spectrometers to large scale particle accelerators.
No moving parts
radiation tolerant materials in excess of 108 Gray
Up to 250°C and even 450°C
Capture pumps required virtually no maintenance
Low initial and operational costs
Small ion pumps come in a wide variety of sizes and configurations. Gamma Vacuum maintains stock of the most common configurations for same-day delivery. These pumps have the added advantage that they can be mounted in any orientation without additional support.
Pumping speed
Ultimate pressure
Starting pressure
Operating bake temp
Max. bake temp (Magnets removed)
l/s
mbar
mbar
°C
°C
MINI
0.2
1x10-11
≤1x10-4
95
450
3S
2-3
1x10-11
≤1x10-4
450
200
5S
4-5
1x10-11
≤1x10-4
250
450
10S/SW
8-10
1x10-11
≤1x10-3
250
450
10ST
8-10
1x10-11
≤1x10-3
80
450
25S/SW
15-20
1x10-11
≤1x10-3
250
450
25ST
15-20
1x10-11
≤1x10-3
100
450
45S
30-40
1x10-11
≤1x10-3
250
450
75S
40-75
1x10-11
≤1x10-3
250
450
Low Profile ion pumps are under 300 mm high for standard configurations. Custom built to each order, the closed magnetic loop of these pumps reduces the stray magnetic field created by the pump making these pumps ideal for any type of charged particle application.
Pumping speed
Ultimate pressure
Starting pressure
Operating bake temp
Max. bake temp (Magnets removed)
l/s
mbar
mbar
°C
°C
100L
80-100
<1x10-11
≤1x10-3
250
450
200L
160-200
<1x10-11
≤1x10-3
250
450
300L
240-300
<1x10-11
≤1x10-3
250
450
400L
320-400
<1x10-11
≤1x10-3
250
450
400LX
320-400
<1x10-11
≤1x10-3
250
450
600L
480-600
<1x10-11
≤1x10-3
250
450
600LX
480-600
<1x10-11
≤1x10-3
250
450
800LX
640-800
<1x10-11
≤1x10-3
250
450
1200 LX
960-1200
<1x10-11
≤1x10-3
250
450
Tall Profile ion pumps are designed for mounting in narrow locations and matching competitive dimensions. These pumps are built to order and designed to fit into locations where a Low Profile ion pump might not fit.
Pumping speed
Ultimate pressure
Starting pressure
Operating bake temp
Max. bake temp (Magnets removed)
l/s
mbar
mbar
°C
°C
150T
120-150
<1x10-11
≤1x10-3
250
450
150TV
120-150
<1x10-11
≤1x10-3
250
450
200T
160-200
<1x10-11
≤1x10-3
250
450
250T
200-250
<1x10-11
≤1x10-3
250
450
300T
240-300
<1x10-11
≤1x10-3
250
450
300TV
240-300
<1x10-11
≤1x10-3
250
450
500T
400-500
<1x10-11
≤1x10-3
250
450
600TV
480-600
<1x10-11
≤1x10-3
250
450
Ion pumps are used in a wide variety of high and ultra-high vacuum (UHV) environments. They can reach the lowest possible vacuum for an economical cost. In addition, ion pumps have some technical advantages over other technologies.
Product Features
HIGH RADIATION TOLERANCE
Capture pumps are built with radiation tolerant materials in excess of 108 Gray. Connectors and cables are also built with radiation tolerant materials for years of continuous operation.
MECHANICAL VIBRATION ELIMINATED
Capture pumps have no moving parts. Vibration from moving parts and electrical noise is eliminated.
HIGH TEMPERATURE TOLERANCE
Without any special consideration, capture pumps can be baked to 250°C. Removing the magnets allows for hotter bakes up to 450°C. Long hot bakes are critical to every UHV system.
REGULAR MAINTENANCE ELIMINATED
Capture pumps require virtually no maintenance and avoid costly vacuum events because they are sealed from atmosphere, saving time, money and resources.
LOW INITIAL AND OPERATIONAL COSTS
Initial cost is typically less than comparable specifications of other types of vacuum pumps. They use minimal or no power for years of low cost operation.
